University of Surrey

Test tubes in the lab Research in the ATI Dance Research

Highly photoconductive amorphous carbon nitride films prepared by cyclic nitrogen radical sputtering

Katsuno, T, Nitta, S, Habuchi, H, Stolojan, V and Silva, SRP (2004) Highly photoconductive amorphous carbon nitride films prepared by cyclic nitrogen radical sputtering APPLIED PHYSICS LETTERS, 85 (14). 2803 - 2805. ISSN 0003-6951

[img]
Preview
PDF
fulltext.pdf

Download (60Kb)

Abstract

We report on the growth of amorphous carbon nitride films (a-CNx) showing the highest conductivity to date. The films were prepared using a layer-by-layer method (a-CNx:LL), by the cyclical nitrogen radical sputtering of a graphite radical, alternated with a brief hydrogen etch. The photosensitivity S of these films is 10(5), defined as the ratio of the photoconductivity sigma(p) to the dark conductivity sigma(d) and is the highest value reported thus far. We believe that the carriers generated by the monochromatic light (photon energy 6.2 eV) in the a-CNx:LL films are primarily electrons, with the photoconductivity shown to increase with substrate deposition temperature.

Item Type: Article
Uncontrolled Keywords: Science & Technology, Physical Sciences, Physics, Applied, Physics, HYDROGENATED CARBON, ELECTROLUMINESCENCE, LUMINESCENCE, ALLOYS
Related URLs:
Divisions: Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Nano-Electronics Centre
Depositing User: Mr Adam Field
Date Deposited: 27 May 2010 14:05
Last Modified: 23 Sep 2013 18:25
URI: http://epubs.surrey.ac.uk/id/eprint/4

Actions (login required)

View Item View Item

Downloads

Downloads per month over past year


Information about this web site

© The University of Surrey, Guildford, Surrey, GU2 7XH, United Kingdom.
+44 (0)1483 300800