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An experimental study of charge distribution in crystalline and amorphous Si nanoclusters in thin silica films

Thogersen, A, Diplas, S, Mayandi, J, Finstad, T, Olsen, A, Watts, JF, Mitome, M and Bando, Y (2008) An experimental study of charge distribution in crystalline and amorphous Si nanoclusters in thin silica films JOURNAL OF APPLIED PHYSICS, 103 (2), ARTN 0.

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Item Type: Article
Divisions : Faculty of Engineering and Physical Sciences > Mechanical Engineering Sciences
Authors :
AuthorsEmailORCID
Thogersen, AUNSPECIFIEDUNSPECIFIED
Diplas, SUNSPECIFIEDUNSPECIFIED
Mayandi, JUNSPECIFIEDUNSPECIFIED
Finstad, TUNSPECIFIEDUNSPECIFIED
Olsen, AUNSPECIFIEDUNSPECIFIED
Watts, JFUNSPECIFIEDUNSPECIFIED
Mitome, MUNSPECIFIEDUNSPECIFIED
Bando, YUNSPECIFIEDUNSPECIFIED
Date : 15 January 2008
Identification Number : 10.1063/1.2832630
Uncontrolled Keywords : Science & Technology, Physical Sciences, Physics, Applied, Physics, PHYSICS, APPLIED, AUGER-PARAMETER SHIFTS, BINDING-ENERGY, SPECTROSCOPIC ANALYSIS, ELECTRONIC-STRUCTURE, SIO2/SI INTERFACE, CORE-ELECTRON, STATE, PHOTOELECTRON, NANOCRYSTALS, DEPENDENCE
Related URLs :
Depositing User : Mr Adam Field
Date Deposited : 27 May 2010 14:07
Last Modified : 04 Jul 2015 13:34
URI: http://epubs.surrey.ac.uk/id/eprint/269

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