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A study of electron field emission as a function of film thickness from amorphous carbon films

Forrest, RD, Burden, AP, Silva, SRP, Cheah, LK and Shi, X (1998) A study of electron field emission as a function of film thickness from amorphous carbon films APPLIED PHYSICS LETTERS, 73 (25). 3784 - 3786. ISSN 0003-6951

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Abstract

The electron field-emission properties of hydrogenated amorphous carbon and nitrogenated tetrahedral amorphous carbon thin films are examined by measuring the field-emission current as a function of the applied macroscopic electric field. The experimental results indicate the existence of an optimum film thickness for low-threshold electron field emission. The predictions of various emission models are compared to the experimental results.

Item Type: Article
Uncontrolled Keywords: Science & Technology, Physical Sciences, Physics, Applied, Physics, DIAMOND-LIKE CARBON, HOT
Related URLs:
Divisions: Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Nano-Electronics Centre
Depositing User: Melanie Hughes
Date Deposited: 11 Oct 2010 15:15
Last Modified: 23 Sep 2013 18:38
URI: http://epubs.surrey.ac.uk/id/eprint/2452

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