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Stress-induced formation of high-density amorphous carbon thin films

Schwan, J, Ulrich, S, Theel, T, Roth, H, Ehrhardt, H, Becker, P and Silva, SRP (1997) Stress-induced formation of high-density amorphous carbon thin films JOURNAL OF APPLIED PHYSICS, 82 (12). 6024 - 6030. ISSN 0021-8979

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Abstract

Amorphous carbon films with high sp3 content were deposited by magnetron sputtering and intense argon ion plating. Above a compressive stress of 13 GPa a strong increase of the density of the carbon films is observed. We explain the increase of density by a stress-induced phase transition of sp2 configured carbon to sp3 configured carbon. Preferential sputtering of the sp2 component in the carbon films plays a minor role compared to the sp2)sp3 transition at high compressive stress formed during the deposition process. Transmission electron microscopy shows evidence of graphitic regions in the magnetron sputtered/Ar plated amorphous carbon thin films. Differences in the microstructure of the tetrahedral amorphous carbon ~ta–C! films deposited by filtered arc and mass selected ion beam; and those films deposited using magnetron sputtering combined with intense ion plating can be used to explain the different electronic and optical properties of both kinds of ta–C films.

Item Type: Article
Uncontrolled Keywords: Science & Technology, Physical Sciences, Physics, Applied, Physics, DIAMOND-LIKE CARBON, NANOCRYSTALLINE C-BN, ION-BEAM DEPOSITION, X-RAY-DIFFRACTION, COMPRESSIVE-STRESS, HIGH-PRESSURE, GRAPHITE, MODEL, TRANSFORMATION, SPECTROSCOPY
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Divisions: Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Nano-Electronics Centre
Depositing User: Melanie Hughes
Date Deposited: 08 Oct 2010 15:43
Last Modified: 23 Sep 2013 18:38
URI: http://epubs.surrey.ac.uk/id/eprint/2443

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