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Characterization of C:H:N deposition from CH4/N-2 rf plasmas using optical emission spectroscopy

Clay, KJ, Speakman, SP, Amaratunga, GAJ and Silva, SRP (1996) Characterization of C:H:N deposition from CH4/N-2 rf plasmas using optical emission spectroscopy JOURNAL OF APPLIED PHYSICS, 79 (9). 7227 - 7233. ISSN 0021-8979

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Item Type: Article
Uncontrolled Keywords: Science & Technology, Physical Sciences, Physics, Applied, Physics, PHYSICS, APPLIED, AMORPHOUS-CARBON FILMS, LASER-INDUCED PLASMA, DIAMOND, NITRIDE, DISCHARGE, DILUTION, GAS, CH4
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Divisions: Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Nano-Electronics Centre
Depositing User: Melanie Hughes
Date Deposited: 29 Sep 2010 13:10
Last Modified: 09 Jun 2014 13:25
URI: http://epubs.surrey.ac.uk/id/eprint/2376

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