Nitrogen containing hydrogenated amorphous carbon for thin-film field emission cathodes
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Amaratunga, GAJ and Silva, SRP (1996) Nitrogen containing hydrogenated amorphous carbon for thin-film field emission cathodes APPLIED PHYSICS LETTERS, 68 (18). 2529 - 2531. ISSN 0003-6951
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Official URL: http://apl.aip.org/resource/1/applab/v68/i18/p2529...
Abstract
Field emission measurements using 0.3 mm thick nitrogen containing hydrogenated amorphous carbon films ~a-C:H:N! on n11-Si cathodes are reported. Onset emission fields as low as 4 Vmm21 have been obtained using a flat plate anode configuration. Uniform emission is observed over the entire cathode area at current densities below 731022 mA cm22. At higher current density preferential emission from spots is observed. The spot emission is imaged using the ITO coated plate anode. A model based on the a-C:H:N acting as a space charge interlayer on the n11-Si is proposed to explain the emission at low electric fields.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | Science & Technology, Physical Sciences, Physics, Applied, Physics, ELECTRON-EMISSION, DIAMOND |
| Divisions: | Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Nano-Electronics Centre |
| Related URLs: | |
| ID Code: | 2369 |
| Deposited By: | Melanie Hughes |
| Deposited On: | 29 Sep 2010 09:25 |
| Last Modified: | 30 Mar 2013 14:45 |
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