Concentration Dependent Interdiffusion in InGaAs/GaAs as Evidenced by High Resolution X-ray Diffraction and Photoluminescence Spectroscopy
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Bollet, F, Gillin, W P, Hopkinson, M and Gwilliam, R (2005) Concentration Dependent Interdiffusion in InGaAs/GaAs as Evidenced by High Resolution X-ray Diffraction and Photoluminescence Spectroscopy Journal of Applied Physics, 97 (1). ISSN 00218979
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Abstract
A high resolution x-ray diffraction (HRXRD) and photoluminescence study of a 10 nm InGaAs/GaAs quantum well structure repeatedly diffused under thermally accurate and timed annealing conditions demonstrates that the Fickian model with a constant coefficient of diffusion is inadequate and that the distribution of compositions of the diffused well cannot be fitted with error functions. A simple model, with the well retaining its square shape and homogeneity while dissolving the barriers when annealed, is successful in modelling both the HRXRD and photoluminescence data.
| Item Type: | Article |
|---|---|
| Additional Information: | Published in <i>Journal of Applied Physics,</i> Vol. 97, Iss. 1. Copyright 2005 American Institute of Physics. Click <a href=http://jap.aip.org/ >here</a> to access the journal's website. |
| Divisions: | Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Ion Beam Centre |
| ID Code: | 216 |
| Deposited By: | Mr Adam Field |
| Deposited On: | 27 May 2010 15:07 |
| Last Modified: | 26 Oct 2012 16:21 |
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