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Josephson effects in MgB2 metal masked ion damage junctions

Kang, DJ, Peng, NH, Jeynes, C, Webb, R, Lee, HN, Oh, B, Moon, SH, Burnell, G, Stelmashenko, NA, Tarte, EJ, Moore, DF and Blamire, MG (2003) Josephson effects in MgB2 metal masked ion damage junctions In: Applied Superconductivity Conference, 2002-08-04 - 2002-08-09, HOUSTON, TEXAS.

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Item Type: Conference or Workshop Item (UNSPECIFIED)
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Ion Beam Centre
Authors :
AuthorsEmail
Kang, DJUNSPECIFIED
Peng, NHUNSPECIFIED
Jeynes, CUNSPECIFIED
Webb, RUNSPECIFIED
Lee, HNUNSPECIFIED
Oh, BUNSPECIFIED
Moon, SHUNSPECIFIED
Burnell, GUNSPECIFIED
Stelmashenko, NAUNSPECIFIED
Tarte, EJUNSPECIFIED
Moore, DFUNSPECIFIED
Blamire, MGUNSPECIFIED
Date : 1 June 2003
Identification Number : 10.1109/TASC.2003.814157
Contributors :
ContributionNameEmail
PublisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, UNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Engineering, Electrical & Electronic, Physics, Applied, Engineering, Physics, ENGINEERING, ELECTRICAL & ELECTRONIC, PHYSICS, APPLIED, focused ion beam, ion implantation, Josephson effects, nanotechnology, MAGNESIUM-DIBORIDE, THIN-FILMS, YBA2CU3O7-DELTA, IMPLANTATION, IRRADIATION, BEAM
Related URLs :
Depositing User : Mr Adam Field
Date Deposited : 27 May 2010 14:39
Last Modified : 17 Jan 2015 14:56
URI: http://epubs.surrey.ac.uk/id/eprint/1280

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