The surface proximity effect on the formation of extended defects in ion beam synthesised SiGe/Si heterostructures

Cristiano, F., Nejim, A. and Hemment, Peter L. F. (1998) The surface proximity effect on the formation of extended defects in ion beam synthesised SiGe/Si heterostructures 1998 International Conference on Ion Implantation Technology Proceedings, 2. pp. 913-916.

Preview

PDF fulltext.pdf Download (514kB)

Abstract

The relaxation of ion beam synthesised SiGe alloys occurs during solid phase epitaxial growth (SPEG) by a roughening of the amorphous/crystalline (a/c) interface, leading to the formation of extended defects. SiGe/Si structures have been formed by implantation of Ge⁺ ions at energies of 70 keV and 400 keV and doses above the critical value for strain relaxation, followed by post-amorphisation to a depth of approx. 1 micro-m and regrowth at 700°C. TEM and RBS analysis of the regrown structures show that relaxation-induced stacking faults (SFs) are nucleated in the vicinity of the peak of the Ge concentration. For an implantation energy of 70 keV, SFs are the only defects observed and they extend up to the surface. For an implantation energy of 400 keV, the SFs terminate within the bulk far from the surface while “hairpin” dislocations are also formed and extend up to the surface. These results are explained in terms of the ratio between the depth at which SFs are nucleated and the roughness of the a/c interface at that depth. Varying the defect nucleation depth by removing a surface layer from the structures implanted at 400 keV prior to SPEG does not result in a change of the size of the SFs, while “hairpin” dislocations are still formed, suggesting that the roughness of the a/c interface during regrowth is only determined by the Ge content in the alloy.

Item Type:	Article
Additional Information:	Crisiano, F., Nejim, A., & Hemment, P. L. F. The surface proximity effect on the formation of extended defects in ion beam synthesised SiGe/Si heterostructures. 1998 International Conference on Ion Implantation Technology Proceedings, 2, 913-916. © 1998 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
Divisions:	Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Ion Beam Centre
Depositing User:	Mr Adam Field
Date Deposited:	27 May 2010 14:39
Last Modified:	23 Sep 2013 18:32
URI:	http://epubs.surrey.ac.uk/id/eprint/1268

Actions (login required)

View Item

Downloads