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Characterization and enviromental impact of plasma products within an ion implanter

Zurrug, H, Mefo, J, Sealy, B, Boudreault, G, Jeynes, C, Webb, RP, Kirkby, KJ, Collart, EJH, Brown, B, Alford, TL, Nastasi, M and Vella, MC (2003) Characterization and enviromental impact of plasma products within an ion implanter In: 14th International Conference on Ion Implantation Technology, 2002-09-18 - 2002-09-27, TAOS, NM.

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Item Type: Conference or Workshop Item (UNSPECIFIED)
Uncontrolled Keywords: Science & Technology, Technology, Physical Sciences, Engineering, Manufacturing, Engineering, Electrical & Electronic, Physics, Applied, Physics, Condensed Matter, Engineering, Physics, ion implantation, plasma products, implant residues, plasma-dopant interactions, Rutherford Backscattering (RBS), Sb implantation, B implantation, silicon
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Divisions: Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Ion Beam Centre
Depositing User: Mr Adam Field
Date Deposited: 27 May 2010 14:39
Last Modified: 09 Jun 2014 13:27
URI: http://epubs.surrey.ac.uk/id/eprint/1257

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