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Absolute dose performance of the SWIFT single wafer ion implanter

Claudio, G, Boudreault, G, Jeynes, C, Sealy, BJ, Low, R, Brown, B, Alford, TL, Nastasi, M and Vella, MC (2003) Absolute dose performance of the SWIFT single wafer ion implanter In: 14th International Conference on Ion Implantation Technology, 2002-09-18 - 2002-09-27, TAOS, NM.


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Item Type: Conference or Workshop Item (UNSPECIFIED)
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Ion Beam Centre
Authors :
Claudio, G
Boudreault, G
Jeynes, C
Sealy, BJ
Low, R
Brown, B
Alford, TL
Nastasi, M
Vella, MC
Date : 1 January 2003
Contributors :
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Engineering, Manufacturing, Engineering, Electrical & Electronic, Physics, Applied, Physics, Condensed Matter, Engineering, Physics, RBS, SILICON
Related URLs :
Depositing User : Mr Adam Field
Date Deposited : 27 May 2010 14:38
Last Modified : 31 Oct 2017 14:01

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